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From: Andrew Lines (lines AT avlsi DOT com)
Date: Sat May 20 2000 - 13:37:12 EDT


As we all know, Magic generates the well and select layers
(CWN,CWP,CSN,CSP) by bloating and munging the diffusion and substrate
diffusion paints.  Although with appropriate DRC rules this can satisfy
all the overlap and spacing to incompatible layers, it often generates
foundry design rule violations on spacing to like layers or makes narrow
bridges between like layers.  We have fabbed chips in the past through
MOSIS with thousands of such "errors" and they work fine.

We asked a foundry (UMC) and they gave us a fairly flimsy sounding
explanation that well to well spacing of electrically connected nwells
might cause latchup, and that nselect to nselect spacing might increase
punchthrough.  Does anybody have a good explanation of why these types
of errors are or are not a problem?  Does anybody using Magic routinely
paint all wells and selects to avoid these types of problems with the
generated layers?





 
 
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