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From: c.connaway (connaway AT connaway DOT com) Date: Fri Nov 23 2001 - 17:41:18 EST
Im trying to make a resistor using the AMIC5N 0.5u High Resist Layer (HR overlap Poly2/electrode), after extraction and than subsequent flattening using ext2sim, the value of the resistor is nowhere near the 1000ohms/sq it should be. While monkeying around in the SCN3ME_SUBM.30.tech27 file I noticed some code that looks like this:
extract
style AMI0.5um(amic5)from:T01X
cscale 1
lambda 30
step 100
sidehalo 8
planeorder well 0
planeorder implant 1
planeorder select 2
planeorder cap 3
planeorder active 4
planeorder metal1 5
planeorder metal2 6
planeorder metal3 7
planeorder oxide 8
planeorder xp 9
planeorder comment 10
planeorder contact 11
planeorder via1 12
planeorder via2 13
resist (ndiff,rnd,ndc,nsd,nsc)/active 82100
resist (pdiff,rpd,pdc,psd,psc)/active 102500
resist (nwell)/well 827000
resist (rnw)/active 827000
resist (pwell)/well 1
resist (poly,fp,rp,pc,pc,nfet,pfet,fet)/active 26000
resist (poly2,ecap,p2c)/cap 26500
resist (phr)/cap 26500
resist (m1,fm1,rm1,ndc,nsc,pdc,psc,pc,p2c,m2c,m2c)/metal1 90
resist (m2,fm2,rm2,m2c,m3c,m3c)/metal2 90
resist (m3,fm3,rm3,m3c,pad)/metal3 50
contact ndc 4 50700
contact pdc 4 99400
contact pc 4 17700
contact p2c 4 17000
contact m2c 4 710
contact m3c 4 810
Is this defining the right values for the resistance of the poly2/high resistance layer that is available for the AMIC5N 0.5u process? Also what about the SCN3ME_SUBM.30.r file, does this play any role when using ext2sim or :extract ?
I noticed that the phrResistor doesnt have anything defined for the Rsquare= line. Should I try to edit these files or am I way off base here? Does this make sense to anyone? Anything will help. Thanks.
C.
"Genius is one percent inspiration and niney-nine percent perspiration"
Thomas Edison
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